By G. Bracchi, D. Ferrari
Communications of the ACM,
January 1971,
Vol. 14 No. 1, Pages 26-32
10.1145/362452.362474
Comments
In this paper CADEP, a problem-oriented language for positioning geometric patterns in a two-dimensional space, is presented.
Although the language has been specifically designed for the automatic generation of integrated circuit masks, it turns out to be well suited also for such other placement problems as architecture design, urban planning, logical and block diagram representation.
The design criteria, the structure, and the specific features of CADEP are illustrated.
The full text of this article is premium content
No entries found
Log in to Read the Full Article
Need Access?
Please select one of the options below for access to premium content and features.
Create a Web Account
If you are already an ACM member, Communications subscriber, or Digital Library subscriber, please set up a web account to access premium content on this site.
Join the ACM
Become a member to take full advantage of ACM's outstanding computing information resources, networking opportunities, and other benefits.
Subscribe to Communications of the ACM Magazine
Get full access to 50+ years of CACM content and receive the print version of the magazine monthly.
Purchase the Article
Non-members can purchase this article or a copy of the magazine in which it appears.
