acm-header
Sign In

Communications of the ACM

ACM TechNews

Helping the Microchip Industry Go (Very Low) With the Flow


View as: Print Mobile App Share:
Process Engineer Richard Kasica holds a silicon wafer in an NIST cleanroom.

A new study by scientists at the National Institute of Standards and Technology (NIST) has uncovered a source of error in an industry-standard calibration method that could lead microchip manufacturers to lose a million dollars or more in a single fabrica

Credit: Curt Suplee/NIST

U.S. National Institute of Standards and Technology (NIST) researchers have rooted out the cause of error in an industry-standard calibration method that could add up to massive losses for microchip manufacturers.

The team developed a mathematical model of the "rate of rise" (RoR) method of measuring pressure and temperature as gas fills a collection tank via mass flow controllers.

They determined conventional measurements can have significant errors due to incorrect temperature values, and lacking corrections for these errors, RoR readings can be off by up to 1%, if not more.

Lam Research's Iqbal Shareef says, "A tiny amount of variation in the flow rate has a profound effect on the etch rate and critical dimensions of the structures" in very large-scale integrated circuits.

NIST's discovery is prompting many chipmakers to reevaluate their practices.

From National Institute of Standards and Technology
View Full Article

 

Abstracts Copyright © 2018 Information Inc., Bethesda, Maryland, USA


 

No entries found

Sign In for Full Access
» Forgot Password? » Create an ACM Web Account